DOI: 10.22184/1992-4178.2022.216.5.42.48

XORS‑200A narrow-gap planar module for dielectric etching developed by NPP ESTO JSC is a universal basic 200 mm etching reactor for mass silicon production featuring key 300 mm system level parameters and allowing both high-aspect dielectric etching and multipatterning processes.

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Разработка: студия Green Art