rus
Issue #3/2026
A. Trushina
INDUCTIVELY COUPLED PLASMA MASS SPECTROMETRY AS AN EFFECTIVE METHOD FOR MONITORING THE PURITY OF MATERIALS IN MICROELECTRONIC PRODUCTION
INDUCTIVELY COUPLED PLASMA MASS SPECTROMETRY AS AN EFFECTIVE METHOD FOR MONITORING THE PURITY OF MATERIALS IN MICROELECTRONIC PRODUCTION
DOI: 10.22184/1992-4178.2026.255.3.176.182
The article discusses the method of inductively coupled plasma mass spectrometry, which allows for highly sensitive quantitative and qualitative analysis of impurities of most metals
and a number of non-metals in chemicals, special gases and semiconductor structures used in microelectronic production.
Tags: impurity analysis inductively coupled plasma mass spectrometry ion optics mass analyzer анализ примесей ионная оптика масс-анализатор масс-спектрометрия с индуктивно связанной плазмой
Subscribe to the journal Electronics: STB to read the full article.
The article discusses the method of inductively coupled plasma mass spectrometry, which allows for highly sensitive quantitative and qualitative analysis of impurities of most metals
and a number of non-metals in chemicals, special gases and semiconductor structures used in microelectronic production.
Tags: impurity analysis inductively coupled plasma mass spectrometry ion optics mass analyzer анализ примесей ионная оптика масс-анализатор масс-спектрометрия с индуктивно связанной плазмой
Subscribe to the journal Electronics: STB to read the full article.
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