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Issue #5/2020
M. Makushin, V. Martynov
MICROELECTRONICS MANUFACTURING TECHNOLOGIES: DEVELOPMENT CHALLENGES. Part 2
MICROELECTRONICS MANUFACTURING TECHNOLOGIES: DEVELOPMENT CHALLENGES. Part 2
DOI: 10.22184/1992-4178.2020.196.5.120.127
The article considers some aspects of the development of microelectronics technologies: ALD and CVD processes, ion implantation, EUV lithography, testing method improvement.
The article considers some aspects of the development of microelectronics technologies: ALD and CVD processes, ion implantation, EUV lithography, testing method improvement.
Теги: atomic layers chemical deposition euv lithography euv литография ion implantation testing атомарные слои ионная имплантация тестирование химическое осаждение
MICROELECTRONICS MANUFACTURING TECHNOLOGIES: DEVELOPMENT CHALLENGES. Part 2
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