rus
Issue #1/2026
A. Sobolev
MODERN CLUSTER EQUIPMENT OF ASIAN MANUFACTURE FOR CARRYING OUT TECHNOLOGICAL OPERATIONS UNDER THIN FILMS ON SEMICONDUCTOR WAFERS
MODERN CLUSTER EQUIPMENT OF ASIAN MANUFACTURE FOR CARRYING OUT TECHNOLOGICAL OPERATIONS UNDER THIN FILMS ON SEMICONDUCTOR WAFERS
DOI: 10.22184/1992-4178.2026.253.1.48.56
The article provides an overview of various types of cluster equipment produced by Asian manufacturers for thin-film processing. Key cluster system parameters that influence thin-film etching, deposition and sputtering processes are discussed.
Tags: magnetron sputtering plasma-chemical etching plasma-enhanced deposition plasma reactor special technological equipment thin films магнетронное распыление плазменно-стимулированное осаждение плазменный реактор плазмохимическое травление специальное технологическое оборудование тонкие пленки
Subscribe to the journal Electronics: STB to read the full article.
The article provides an overview of various types of cluster equipment produced by Asian manufacturers for thin-film processing. Key cluster system parameters that influence thin-film etching, deposition and sputtering processes are discussed.
Tags: magnetron sputtering plasma-chemical etching plasma-enhanced deposition plasma reactor special technological equipment thin films магнетронное распыление плазменно-стимулированное осаждение плазменный реактор плазмохимическое травление специальное технологическое оборудование тонкие пленки
Subscribe to the journal Electronics: STB to read the full article.
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