rus
DOI: 10.22184/1992-4178.2022.218.7.134.138
USOTP-1 vacuum jet cleaning machine from PROTON is designed for technological processing (cleaning, rinsing, drying) of semiconductor wafers. A unique Russian technology is used namely jets in a vacuum.
USOTP-1 vacuum jet cleaning machine from PROTON is designed for technological processing (cleaning, rinsing, drying) of semiconductor wafers. A unique Russian technology is used namely jets in a vacuum.
Теги: silicon wafers steam treatment vacuum jet cleaning кремниевые пластины обработка изделий паром струйная отмывка в вакууме
JETS IN A VACUUM IS A SOLUTION FOR MICROELECTRONICS
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